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Hexachlorodisilane

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For Research Use Only | Not For Clinical Use
CATAP13465775
CAS13465-77-5
Structure
MDL NumberMFCD00011599
Molecular Weight268.89
EC Number236-704-1
InChI KeyLXEXBJXDGVGRAR-UHFFFAOYSA-N
Description96%
Density1.562 g/mL at 25 °C (lit.)
Assay96%
BP144-145.5 °C (lit.)
Linear Formula(SiCl3)2
Refractive Indexn20/D 1.475 (lit.)
Size5G, 25G
1

Characterization of Shock-Sensitive Deposits From the Hydrolysis of Hexachlorodisilane

Yu-Jhen Lin, Chien-Ho Liu, Mo-Geng Chin, Cheng-Chieh Wang, Sheng-Hsun Wang, Hsiao-Yun Tsai, Jenq-Renn Chen, Eugene Y Ngai, Ram Ramachandran

ACS Omega. 2019 Jan 16;4(1):1416-1424.

PMID: 31459409

1

Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane

Xin Meng, Harrison Sejoon Kim, Antonio T Lucero, Su Min Hwang, Joy S Lee, Young-Chul Byun, Jiyoung Kim, Byung Keun Hwang, Xiaobing Zhou, Jeanette Young, Michael Telgenhoff

ACS Appl Mater Interfaces. 2018 Apr 25;10(16):14116-14123.

PMID: 29551067

1

Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper

Harrison Sejoon Kim, Xin Meng, Si Joon Kim, Antonio T Lucero, Lanxia Cheng, Young-Chul Byun, Joy S Lee, Su Min Hwang, Aswin L N Kondusamy, Robert M Wallace, Gary Goodman, Alan S Wan, Michael Telgenhoff, etc.

ACS Appl Mater Interfaces. 2018 Dec 26;10(51):44825-44833.

PMID: 30485061

1

Silicon(IV) Corroles

Giuseppe Pomarico, Donato Monti, Martina Bischetti, Andrea Savoldelli, Frank R Fronczek, Kevin M Smith, Damiano Genovese, Luca Prodi, Roberto Paolesse

Chemistry. 2018 Jun 12;24(33):8438-8446.

PMID: 29637630

1

Tetraarylethylenes From Diarylmethanones and Hexachlorodisilane: The "Sila-McMurry" Reaction

Maximilian Moxter, Jan Tillmann, Matthias Füser, Michael Bolte, Hans-Wolfram Lerner, Matthias Wagner

Chemistry. 2016 Nov 2;22(45):16028-16031.

PMID: 27690327

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