Home
Resources
Publications
Characterization of Self-Assembled Monolayers on a Ruthenium Surface

Characterization of Self-Assembled Monolayers on a Ruthenium Surface

A Shaheen, J M Sturm, R Ricciardi, J Huskens, C J Lee, F Bijkerk

Langmuir. 2017 Jun 27;33(25):6419-6426.

PMID: 28585831

Abstract:

We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal-sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

Chemicals Related in the Paper:

Catalog Number	Product Name	Structure	CAS Number	Price
AP2917262	1-Hexadecanethiol		2917-26-2	Price

As a specialist in analytical chemical Products, Alfa Chemistry offers consumers a wealth of raw materials and a full range of technologies and services.

QUICK LINKS

HEADQUARTERS

Tel:

Fax:

Email: