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Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer With Sub-15 Nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer With Sub-15 Nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Zhiwei Sun, Zhenbin Chen, Wenxu Zhang, Jaewon Choi, Caili Huang, Gajin Jeong, E Bryan Coughlin, Yautzong Hsu, XiaoMin Yang, Kim Y Lee, David S Kuo, Shuaigang Xiao, Thomas P Russell

Adv Mater. 2015 Aug 5;27(29):4364-70.

PMID: 26088198

Abstract:

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

Chemicals Related in the Paper:

Catalog Number	Product Name	Structure	CAS Number	Price
AP25014157	Poly(2-vinylpyridine)		25014-15-7	Price

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