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Dual Patterning of a Poly(acrylic Acid) Layer by Electron-Beam and Block Copolymer Lithographies

Dual Patterning of a Poly(acrylic Acid) Layer by Electron-Beam and Block Copolymer Lithographies

Anthony C Pearson, Matthew R Linford, John N Harb, Robert C Davis

Langmuir. 2013 Jun 18;29(24):7433-8.

PMID: 23342948

Abstract:

We show the controllable patterning of palladium nanoparticles in both one and two dimensions using electron-beam lithography and reactive ion etching of a thin film of poly(acrylic acid) (PAA). After the initial patterning of the PAA, a monolayer of polystyrene-b-poly-2-vinylpyridine micelles is spun cast onto the surface. A short reactive ion etch is then used to transfer the micelle pattern into the patterned poly(acrylic acid). Finally, PdCl2 is loaded from solution into the patterned poly(acrylic acid) features, and a reactive-ion etching process is used to remove the remaining polymer and form Pd nanoparticles. This method yields location-controlled patches of nanoparticles, including single- and double-file lines and nanoparticle pairs. A locational accuracy of 9 nm or less in one direction was achieved by optimizing the size of the PAA features.

Chemicals Related in the Paper:

Catalog Number	Product Name	Structure	CAS Number	Price
LS74319	Poly(L-lactide-block-acrylic acid)			Price

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