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Preparation of Polyhedral Oligomeric Silsesquioxane Based Imprinted Monolith

Preparation of Polyhedral Oligomeric Silsesquioxane Based Imprinted Monolith

Fang Li, Xiu-Xiu Chen, Yan-Ping Huang, Zhao-Sheng Liu

J Chromatogr A. 2015 Dec 18;1425:180-8.

PMID: 26627587

Abstract:

Polyhedral oligomeric silsesquioxane (POSS) was successfully applied, for the first time, to prepare imprinted monolithic column with high porosity and good permeability. The imprinted monolithic column was synthesized with a mixture of PSS-(1-Propylmethacrylate)-heptaisobutyl substituted (MA 0702), naproxon (template), 4-vinylpyridine, and ethylene glycol dimethacrylate, in ionic liquid 1-butyl-3-methylimidazolium tetrafluoroborate ([BMIM]BF4). The influence of synthesis parameters on the retention factor and imprinting effect, including the amount of MA 0702, the ratio of template to monomer, and the ratio of monomer to crosslinker, was investigated. The greatest imprinting factor on the imprinted monolithic column prepared with MA 0702 was 22, about 10 times higher than that prepared in absence of POSS. The comparisons between MIP monoliths synthesized with POSS and without POSS were made in terms of permeability, column efficiency, surface morphology and pore size distribution. In addition, thermodynamic and Van Deemter analysis were used to evaluate the POSS-based MIP monolith.

Chemicals Related in the Paper:

Catalog Number	Product Name	Structure	CAS Number	Price
AP871126431	PSS-(3-Tosyloxypropyl)-heptaisobutyl substituted		871126-43-1	Price

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