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Self-assembled Monolayers of 2-(thienyl)hexylphosphonic Acid on Native Oxide Surface of Silicon Fabricated by Air-Liquid Interface-Assisted Method

Chih-Wei Hsu, Huei-Ru Liou, Wei-Fang Su, Leeyih Wang

J Colloid Interface Sci. 2008 Aug;324(1-2):236-9.

PMID: 18513736

Abstract:

A simple, fast, and low-compound-consuming procedure based on the air-liquid interface-assisted method for preparing self-assembled monolayers (SAMs) of organic molecules with phosphonic acid head groups on the native oxide surface of silicon was demonstrated. The SAMs thus prepared were characterized by contact angle measurement, X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), and atomic force microscopy (AFM). This approach enabled the fabrication of ordered SAMs in a large-area substrate.

Chemicals Related in the Paper:

Catalog Number Product Name Structure CAS Number Price
AP4721248 Hexylphosphonic acid Hexylphosphonic acid 4721-24-8 Price
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