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Thermal Hysteresis and Thickness Dependence of the Molecular Orientation of Poly(di-N-Hexylsilane) in the Film State

Thermal Hysteresis and Thickness Dependence of the Molecular Orientation of Poly(di-N-Hexylsilane) in the Film State

Hiroaki Horiuchi, Tomihiko Ishihara, Shin-ichi Tsunoda, Daisuke Morishita, Tomoyuki Takei, Tetsuo Okutsu, Toshihiro Seko, Hiroaki Sugino, Yasuyuki Kawakami, Hamao Watanabe, Minoru Abe, Shoji Takigami, Hiroshi Hiratsuka

J Phys Chem B. 2006 May 11;110(18):9072-8.

PMID: 16671716

Abstract:

Molecular orientation of poly(di-n-hexylsilane) adsorbed on poly(vinyl alcohol) film has been studied by making use of the stretching technique. Dichroic ratio, Rd, strongly depended on the thickness of poly(di-n-hexylsilane) thin film and the highest value ca. 19 was observed at the film thickness of 110 +/- 30 nm. The thermal hysteresis of the molecular orientation was observed in the heating-cooling cycles. By studying the fluorescence spectrum it was confirmed that a portion of the poly(di-n-hexylsilane) molecules were in transoid conformation even at 320 K, although most of poly(di-n-hexylsilane) molecules were in disordered conformation (conformation D). This poly(di-n-hexylsilane) in transoid conformation is formed in the stretching process and may play a role of crystallization nucleus to induce the whole orientation of the poly(di-n-hexylsilane) in the film state.

Chemicals Related in the Paper:

Catalog Number	Product Name	Structure	CAS Number	Price
AP1072146	Hexylsilane		1072-14-6	Price

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