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Characterization of Shock-Sensitive Deposits From the Hydrolysis of Hexachlorodisilane

Characterization of Shock-Sensitive Deposits From the Hydrolysis of Hexachlorodisilane

Yu-Jhen Lin, Chien-Ho Liu, Mo-Geng Chin, Cheng-Chieh Wang, Sheng-Hsun Wang, Hsiao-Yun Tsai, Jenq-Renn Chen, Eugene Y Ngai, Ram Ramachandran

ACS Omega. 2019 Jan 16;4(1):1416-1424.

PMID: 31459409

Abstract:

In this work, the shock sensitivity of hexachlorodisilane (HCDS) hydrolysis products was studied. The hydrolysis conditions included vapor and liquid HCDS hydrolysis in moist air. Shock sensitivity was determined by using a Fall hammer apparatus. Extensive infrared studies were done for the hydrolysis products. It was found that the Si-Si bond in HCDS during hydrolysis is preserved and can be cleaved by shock, leading to intramolecular oxidation of the neighboring silanol (Si-OH) groups to form a networked Si-O-Si structure and hydrogen gas. The limiting impact energy for shock sensitivity was also found proportional to the oxygen/silicon ratio in the deposit. Finally, recommendations are given for controlling the shock sensitivity of the hydrolyzed deposit.

Chemicals Related in the Paper:

Catalog Number	Product Name	Structure	CAS Number	Price
AP13465775	Hexachlorodisilane		13465-77-5	Price

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